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Cleanroom in ZwijnaardeA large part of our test and processing equipment is located within the UGent cleanroom - classification up to ISO class 5 - on the campus Tech Lane Ghent Science Park - Campus Ardoyen. |
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Have a look inside our cleanroom building in this 15 minutes video ...
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... or explore the inside in this 3D view:
link (kuula). |
EVG 620 double-sided mask alignerThe mask aligner is used to transfer a pattern to a photosensitive material by selective exposure (through a mask) from a UV radiation source. The equipment supports several modes (proximity, soft/ hard/vacuum contact) and can also do bottom side alignment. It can also be used in nano-imprint mode, where the pattern is transferred by imprinting. |
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Heidelberg DWL66 Laser Direct ImagingThe Heidelberg DWL66 LDI system uses laser direct imaging (LDI) to expose photosensitive materials with resolution down to 1 µm. |
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Voyager EBEAM50kEV Electron beam lithography for defining patterns with resolution down to 10 nm. Pattern generator 20bits, 500µm writing field. For samples and wafers up to 200mm. Traxx option for continuous writing of structures (fixed beam, moving stage). |
SpinnerDiverse spinner for spincoating polymer layers including photosensitive resist layers. For samples and wafers up to 200mm. |
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PVA350 conformal coatingThe PVA350 is a flexible three axis robot that is suitable for virtually any laboratory selective coating and automated dispensing application. It is possible to mount different valve types. Our setup is currently equipped with a FCS300-ES spray valve, which provides a repeatable, concentrated coating film in circular pattern widths ranging from 3 to 13mm. |
3D Micromac microSTRUCT vario ps/fs Laser setupPico- and femtosecond laser setup ideally suited for laser structuring, cutting, drilling and welding applications on a variety of substrates, e.g. metals, semiconductors, alloys, transparent and biological material, ceramics and thin film compound systems. The setup is equipped with following lasers: femtosecond pulse laser at 1030.5nm; picosecond pulse laser at 1064nm, 532nm and 355nm. |
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Optec multilaser setupThe custom build multilaser setup is equiped with three different lasers: an excimer laser at 248nm, a CO2 laser at 9 to 11µm and a ND-Yag laser at 354.7nm. |
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DISCO DAD322 Dicing machineThe Disco DAD322 is a fully automated dicing saw to cut materials such as silicon wafers and glass substrates. |
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Logitech PM5 Precision Lapping and Polishing SystemThe Logitech PM5 Lapping and Polishing Machine is a workstation that is used for the back-thinning of individual dies. The individual chip thinning technology was optimized for Silicon chips as well as for GaAs/InP Opto-Electronic components. |
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Vacuum laminating press (Lauffer RLKV 25)Automated vacuum lamination press with controlled temperature and pressure profiles for 330 mm by 280 mm substrates |
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Vacuum forming machine (Formech 300XQ)Vacuum forming of thermoplastic materials using an infrared heater. |
Large area processing line for flex PCBDegrease/µ-etch, development, etch and strip line for 12” by 9” flexible PCBs combined with a Bungard Large area UV exposure machine. |
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Wet benches and exhaust benchesMore than 10 wet benches for safer working with chemicals, including acids, bases and solvents. Wet benches allow for clean working (class 100). |
JEOL JSM-6500 SEM incl. Energy Dispersive Spectroscopy (EDS)Imaging using a scanning electron beam and several detector heads : secondary electrons, back-scattered electrons, cathodo-luminescent photons. Elemental analysis using electron dispersive spectroscopy is also possible. |
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JSM-7000F TFEG-SEM with JED-2300F EDSIn order to obtain higher resolution and smaller spot sizes for analysis, a field emission gun scanning electron microscope (FEG-SEM) is indispensable. |
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WYKO NT3300 non-contact optical profilerA white light interferometer is capable of mapping a several millimeter wide area in a single measurement, with sub-nanometer resolution, providing instantaneous information about surface roughness, shape and waviness. |
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JEOL IB-09010CP Ion beam cross section polisherPolishing cross-section surfaces by using an ion beam. This instrument uses accelerated Argon ions (at 2 to 6 kV) to precisely remove material from the sectioned sample. |
Tresky die and flip-chip bonderDie and flip-chip bonder for the assembly of bare-die components with and accuracy of ± 5 µm. |
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EVG 501 Wafer BonderWafer bonding tool for substrates up to 200 mm wafers. |
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GDP global dispenserAutomated needle dispenser for controlled deposition of adhesives or solder paste. |
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EKRA E4-STS Screen printerFully automatic screen printer for accurate deposition of adhesives or solder paste using either screens or stencils. |
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IBL SLC 300 Vapour phase reflow ovenReflow oven for solder pastes with a programmable temperature profile using the vapour phase of an inert liquid for the transfer of heat. |
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Optomec 300-UP Aerosol Jet PrinterThe aerosol-jet system is used to print metallic conductive inks (silver, gold, copper, etc.) based on creating an aerosol of a functional liquid ink and focusing the aerosol stream on the substrate by a nitrogen gas flow. |
CTS CS-40/200 climate chamberClimate chamber for Thermal cycling (-40°C/+150°C, 6°/min) and Temperature-Humidity (10 - 95 °C, 10 – 98 % RH). |
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Votsch VTS 7040-15/S climate chamberClimate chamber for Temperature cycling (-70°C/+180°C, 16°/min) with in-situ resistance measurement. |
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Instron 5543 Universal Testing MachineElectromechanical, or universal testing machines, are most commonly used for static testing in a tensile or compression mode within a single frame. This system is equipped for stress/strain measurements and cyclic endurance testing. |
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Dage 4000 multipurpose bond testerMechanical testing of interconnections and assemblies. Available modules include peel-strength, die-shear, ballshear, and wire-pull tests. |
Oscilloscopes & logic analyzers
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Active probes
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Power meters & electronic loads
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Sourcemeters, digital multimeters & parametric analyzers
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Spectrum, Network & impedance measurements
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Miscellaneous
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